/ en-us Â鶹ÒùÔº internet news portal provides the latest news on science including: Â鶹ÒùÔºics, Nanotechnology, Life Sciences, Space Science, Earth Science, Environment, Health and Medicine. Researchers have developed a new imaging spectrometer that is much lighter and smaller than state-of-the-art instruments while maintaining the same high level of performance. Because of its small size and modular design, the new instrument is poised to bring this advanced analytical technique to airborne vehicles and even planetary exploration missions. /news/2020-11-imaging-spectrometer-compromising.html Optics & Photonics Thu, 05 Nov 2020 13:26:09 EST news523805157 An optical device that resembles a miniaturized lighthouse lens can make it easier to peer into Petri dishes and observe molecular-level details of biological processes, including cancer cell growth. Developed by KAUST, the new lens is also very cost effective. /news/2020-10-custom-fabricated-microscope-lens-lighthouse.html Optics & Photonics Mon, 05 Oct 2020 09:41:12 EDT news521109668 Laser-scanning microscopes can be miniaturized to image microenvironments in vivo via inclusion inside optical micromechanical system (MEMS) devices to replace the existing larger components. Multifunctional active optical devices are emerging components that support miniaturization for diffraction-limited performance with simpler optical system designs in optical devices. In a recent study, Tianbo Liu and a team of researchers in the departments of Electrical and Computer Engineering and Dermatology in the U.S. proposed a catadioptric (allowing both light reflection and refraction) microscope objective lens, featuring an integrated MEMS device to perform biaxial scanning, axial focus adjustment and control spherical aberration. /news/2019-07-mems-in-the-lens-architecture-laser-scanning-microscopy.html General Â鶹ÒùÔºics Optics & Photonics Tue, 09 Jul 2019 09:30:01 EDT news481793708 Researchers at the Centre for Automation and Robotics, a joint centre of the Universidad Politecnica de Madrid and the Spanish National Research Council (UPM-CSIC), have developed a training tool to improve the use of hand-held detectors in humanitarian demining and to increase user security. /news/2012-12-tool-tasks-humanitarian-demining.html Engineering Tue, 11 Dec 2012 08:58:44 EST news274438383 Despite their tiny brains, bees have remarkable navigation capabilities based on their vision. Now scientists have recreated a light-weight imaging system mimicking a honeybee's field of view, which could change the way we build mobile robots and small flying vehicles. /news/2010-08-artificial-bee-eye-insight-insects.html Engineering Fri, 06 Aug 2010 00:20:01 EDT news200226410 South Korean researchers have designed and built an inexpensive optical lens that collects light from a large area and produces a virtually distortion-free wide-angle image. Standing in contrast to commonly known "fisheye" lenses, which produce significant amounts of visual distortion, low-distortion wide-angle lenses can potentially improve image-based applications such as security-camera systems and robot navigation. The new wide-angle lens is lighter, smaller and more affordable than commercially available "rectilinear" lenses, which also produce low-distortion views. /news/2006-11-wide-angle-lens-pictures-distortion.html General Â鶹ÒùÔºics Thu, 30 Nov 2006 11:56:07 EST news84110167 ASML Holding NV today announced significant progress towards development of both high NA immersion and Extreme Ultra Violet (EUV) lithography technology: two critical elements of the semiconductor industry’s ability to continue its historical trend of packing more power onto silicon chips. /news/2005-12-asml-impacts-industry-roadmap-immersion.html Tue, 06 Dec 2005 14:57:22 EST news8800 ASML Holding NV (ASML) today announced a new lithography system with the highest numerical aperture (NA) – 1.2 – in the semiconductor industry. The ASML TWINSCAN XT:1700i system is a 193 nm immersion scanner capable of volume chip production at the 45 nm node. The new system has a NA that jumped from 0.93 to 1.2, skipping the perceived, pre-immersion barrier of 1.0. The first shipment to a customer, a leading semiconductor manufacturer ordering its second ASML immersion system, will take place in Q1 2006. /news/2005-07-asml-industry-highest-na-immersion.html Wed, 13 Jul 2005 15:07:57 EDT news5140 Austin, Texas and Oxford, England (7 July 2004) -- International SEMATECH and Exitech have announced an agreement to develop the world’s first ultra high numerical aperture (NA = 1.3) 193 nm wavelength immersion lithography tool. This groundbreaking microexposure tool, the MS 193i, will help speed the development of critical infrastructure for immersion lithography at SEMATECH’s Immersion Technology Center in Austin, Texas. /news/2004-07-sematech-exitech-worlds-ultra-high.html Wed, 07 Jul 2004 09:02:09 EDT news335